Overall, CaF2 sputtering targets play a vital role in the production of high-performance optical coatings and components, making them essential in industries such as optics, telecommunications, aerospace, and more.

Proper handling and storage of CaF2 sputtering targets are crucial to maintain their purity and prevent contamination. Additionally, optimizing the sputtering parameters and deposition conditions are essential for obtaining high-quality thin films with desirable optical properties.

Overall, CaF2 sputtering targets play a vital role in the production of high-performance optical coatings and components, making them essential in industries such as optics, telecommunications, aerospace, and more.

Sputtering is a deposition technique where energetic ions bombard the surface of a target material, causing atoms or molecules to be dislodged and deposited onto a substrate, forming a thin film. CaF2 sputtering targets are usually made from high-purity CaF2 material to ensure consistent and reliable film deposition.

Niobium oxide sputtering target from ATT is an oxide sputtering material containing Nb and O. Niobium is a chemical element that originated from Niobe, daughter of king Tantalus from Greek mythology. It was first mentioned in 1801 and observed by C. Hatchett. The isolation was later accomplished and announced by W. Blomstrand.

DW NightWatch™ DW-ILIRIP940 IP-enabled Infrared (IR) LED outdoor illuminator incorporates the latest surface mount Dual-Core™ LEDs combined with enhanced optical output and outstanding reliability to provide users with smart lighting solutions for a wide range of applications.NightWatch™ illuminators include an interchangeable lens pack to deliver a variety of angles out of the box providing users the flexibility to create different elliptical beam profiles. Using PoE and IP communication, the SiteWatch™ detectors support direct integration with DW Spectrum® IPVMS.

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

Sputtering is a deposition technique where energetic ions bombard the surface of a target material, causing atoms or molecules to be dislodged and deposited onto a substrate, forming a thin film. CaF2 sputtering targets are usually made from high-purity CaF2 material to ensure consistent and reliable film deposition.

Calcium Fluoride (CaF2)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Calcium Fluoride (CaF2) sputtering targets are widely used in thin film deposition processes for various applications, especially in the field of optics and photonics. CaF2 is a transparent compound with excellent optical properties, making it suitable for applications such as anti-reflection coatings, mirrors, lenses, and windows.

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Black Iron Oxide (Fe3O4) sputtering target is a solid material that is used as a source of Fe3O4 in sputtering processes. It is commonly used to produce highly uniform and high-quality thin films for various applications, including magnetic data storage, magnetic sensors, and biomedical imaging.

Digital Watchdog® IP cameras, analog cameras, NVRs, DVRs, network devices and management software sold and distributed worldwide are designed and developed in U.S.A. and Korea. Manufactured in South Korea and Taiwan.

N-type Silicon (Si) sputtering target is a type of thin-film deposition material used for the fabrication of electronic components such as solar cells, semiconductor devices, and integrated circuits.

DW NightWatch™ DW-ILIRIP940 IP-enabled Infrared (IR) LED outdoor illuminator incorporates the latest surface mount Dual-Core™ LEDs combined with enhanced optical output and outstanding reliability to provide users with smart lighting solutions for a wide range of applications.NightWatch™ illuminators include an interchangeable lens pack to deliver a variety of angles out of the box providing users the flexibility to create different elliptical beam profiles. Using PoE and IP communication, the SiteWatch™ detectors support direct integration with DW Spectrum® IPVMS.

Proper handling and storage of CaF2 sputtering targets are crucial to maintain their purity and prevent contamination. Additionally, optimizing the sputtering parameters and deposition conditions are essential for obtaining high-quality thin films with desirable optical properties.

Tantalum nitride (TaN) sputtering targets are high-purity materials used in thin-film deposition processes. These targets are made of tantalum nitride, a compound that offers excellent electrical conductivity, thermal stability, and high melting point.

CaF2 sputtering targets are available in different shapes and sizes, depending on the specific requirements of the deposition system. They can be used in various physical vapor deposition (PVD) techniques, including magnetron sputtering, ion beam sputtering, or electron beam evaporation, to achieve precise and controlled deposition of CaF2 thin films.

Digital Watchdog® IP cameras, analog cameras, NVRs, DVRs, network devices and management software sold and distributed worldwide are designed and developed in U.S.A. and Korea. Manufactured in South Korea and Taiwan.

ATTs’Calcium Fluoride (CaF2)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Calcium Fluoride (CaF2) sputtering targets are widely used in thin film deposition processes for various applications, especially in the field of optics and photonics. CaF2 is a transparent compound with excellent optical properties, making it suitable for applications such as anti-reflection coatings, mirrors, lenses, and windows.

CaF2 sputtering targets are available in different shapes and sizes, depending on the specific requirements of the deposition system. They can be used in various physical vapor deposition (PVD) techniques, including magnetron sputtering, ion beam sputtering, or electron beam evaporation, to achieve precise and controlled deposition of CaF2 thin films.