Extreme uvlithography

‌‌The work on EUV lasers at YPI uses a capillary discharge in argon plasma to produce laser output at wavelength 46.9 nm.  Work is ongoing to develop the laser for the ablation of micro-features in solids and to understand the physics of the high density plasmas formed by EUV laser ablation.

Extreme ultra-violet (EUV) light has many realised and potential applications. For example, the fastest computers chips are now processed using EUV light to expose photo-resist.  EUV light can be focused to widths approaching the wavelength of the light enabling small features in photoresist to be exposed.

School of Physics, Engineering and Technology University of York, York, YO10 5DD, UK Tel: work +44 (0)1904 321334 | pet@york.ac.uk