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High-sensitivity inspection that can identify DOIs of 20 nm and less throughout the whole surface of non-patterned wafers is becoming increasingly necessary as a result. There is a great demand for high throughput in addition to high-sensitivity inspection to increase yield, which lowers inspection costs.

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With the launch of this product, Hitachi High-Tech will continue to support customers’ mass production of semiconductor devices by enhancing yields and lowering inspection expenses.Non-patterned wafer inspection systems are used for tasks including managing particles and flaws in semiconductor device manufacturing machinery and monitoring the state of non-patterned wafers.

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Less setup is needed for bright-field microscopy in order to view the samples. finding errors or flaws in the programme where its performance is poor or does not meet its specifications; A test that causes the system to behave erroneously and hence reveals a flaw in the system is successful.

The LS9600 is a new system from Hitachi High-Tech Company that can find particles and flaws on non-patterned bright field wafer deface inspection surfaces.

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The factory’s mainstay technology, brightfield inspection, measures light coming from a higher angle. It illuminates a wafer using broadband light. The light is then captured, and a digital image is created. Brightfield measures light reflected between 25 to 30 degrees. It’s between 30 and 40 degrees in Greyfield.

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When compared to our previous generation systems, it has a new high-output, short-wavelength laser that increases throughput at the sensitivity levels necessary for the mass production of cutting-edge semiconductor devices by about 2.6 times.

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The size of the important faults that affect yield during the manufacturing process has also decreased as a result of the shrinkage of semiconductor devices.

The Global Bright Field Wafer Defect Inspection System market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.

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By identifying faults at an early stage and preventing yield losses, step-by-step scanning for defect inspection helps semiconductor producers. Expand every Bright-field microscopy advantages The colour of the visible structures is not altered by the optics. Certain structures are made visible by stains.

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