Transition state analogs

Calcium Fluoride (CaF2) sputtering targets are widely used in thin film deposition processes for various applications, especially in the field of optics and photonics. CaF2 is a transparent compound with excellent optical properties, making it suitable for applications such as anti-reflection coatings, mirrors, lenses, and windows.

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Sputtering is a deposition technique where energetic ions bombard the surface of a target material, causing atoms or molecules to be dislodged and deposited onto a substrate, forming a thin film. CaF2 sputtering targets are usually made from high-purity CaF2 material to ensure consistent and reliable film deposition.

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Overall, CaF2 sputtering targets play a vital role in the production of high-performance optical coatings and components, making them essential in industries such as optics, telecommunications, aerospace, and more.

Proper handling and storage of CaF2 sputtering targets are crucial to maintain their purity and prevent contamination. Additionally, optimizing the sputtering parameters and deposition conditions are essential for obtaining high-quality thin films with desirable optical properties.

Substrate analogppt

Calcium Fluoride (CaF2)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

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Substrate analogexamples

Overall, CaF2 sputtering targets play a vital role in the production of high-performance optical coatings and components, making them essential in industries such as optics, telecommunications, aerospace, and more.

Glycosyltransferases (GTs) are a large family of carbohydrate-active enzymes, which act as nature's glycosylation agents. GTs catalyse the transfer of a mono- or oligosaccharide from a glycosyl donor to an individual acceptor, and play a central role in the biosynthesis of complex carbohydrates, glycans and glycoconjugates. Several GTs have emerged as potential drug targets in a range of therapeutic areas, including infection, inflammation and cancer. Small molecular GT inhibitors are therefore sought after not only as chemical tools for glycobiology, but also as potential lead compounds for drug discovery. Most existing GT inhibitors are donor or acceptor analogues with limited potential for further development due to intrinsic drawbacks, such as a lack of cell penetration and limited chemical stability. In this article, we review recent progress in the identification of alternative inhibitor chemotypes that are not structurally derived from GT donors or acceptors. This growing class of non-substrate-like GT inhibitors now includes several examples with drug-like properties, which provide exciting new starting points for medicinal chemistry and drug discovery. The increasing availability of such alternative GT inhibitor chemotypes represents a significant advance, which will help realise the considerable potential of this important enzyme family as therapeutic targets.

Black Iron Oxide (Fe3O4) sputtering target is a solid material that is used as a source of Fe3O4 in sputtering processes. It is commonly used to produce highly uniform and high-quality thin films for various applications, including magnetic data storage, magnetic sensors, and biomedical imaging.

Tantalum nitride (TaN) sputtering targets are high-purity materials used in thin-film deposition processes. These targets are made of tantalum nitride, a compound that offers excellent electrical conductivity, thermal stability, and high melting point.

Substrate analogenzyme inhibitors

b Department of Chemistry, School of Natural & Mathematical Sciences, King's College London, Britannia House, 7 Trinity Street, London, UK E-mail: gerd.wagner@kcl.ac.uk Tel: +44 (0)20 7848 1926

Niobium oxide sputtering target from ATT is an oxide sputtering material containing Nb and O. Niobium is a chemical element that originated from Niobe, daughter of king Tantalus from Greek mythology. It was first mentioned in 1801 and observed by C. Hatchett. The isolation was later accomplished and announced by W. Blomstrand.

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Sputtering is a deposition technique where energetic ions bombard the surface of a target material, causing atoms or molecules to be dislodged and deposited onto a substrate, forming a thin film. CaF2 sputtering targets are usually made from high-purity CaF2 material to ensure consistent and reliable film deposition.

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Proper handling and storage of CaF2 sputtering targets are crucial to maintain their purity and prevent contamination. Additionally, optimizing the sputtering parameters and deposition conditions are essential for obtaining high-quality thin films with desirable optical properties.

ATTs’Calcium Fluoride (CaF2)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Substrate analoguses

CaF2 sputtering targets are available in different shapes and sizes, depending on the specific requirements of the deposition system. They can be used in various physical vapor deposition (PVD) techniques, including magnetron sputtering, ion beam sputtering, or electron beam evaporation, to achieve precise and controlled deposition of CaF2 thin films.

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Calcium Fluoride (CaF2) sputtering targets are widely used in thin film deposition processes for various applications, especially in the field of optics and photonics. CaF2 is a transparent compound with excellent optical properties, making it suitable for applications such as anti-reflection coatings, mirrors, lenses, and windows.

CaF2 sputtering targets are available in different shapes and sizes, depending on the specific requirements of the deposition system. They can be used in various physical vapor deposition (PVD) techniques, including magnetron sputtering, ion beam sputtering, or electron beam evaporation, to achieve precise and controlled deposition of CaF2 thin films.

N-type Silicon (Si) sputtering target is a type of thin-film deposition material used for the fabrication of electronic components such as solar cells, semiconductor devices, and integrated circuits.

a Institute of Pharmaceutical Science, School of Biomedical Sciences, King's College London, London, UK