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The Iris system is targeted to provide our customer the best cost-of-ownership with a dedicated application-specific optical configuration for HVM applications in semiconductor manufacturing.
Subsurface defect inspection and classification for silicon carbide (SiC) and gallium nitride (GaN) based wafers and compound semiconductor materials
Subsurface defect inspection and classification for silicon carbide (SiC) and gallium nitride (GaN) based wafers and compound semiconductor materials
Resolve Optics lens adapters are characterised by their ability to change the field of view or image format of specific lenses, while maintaining high ...
Laowa 100mm f/2.8 2:1 Ultra Macro APO is not only a exceptionally macro lens. It can also focus to infinity and is a very decent telephoto portrait lens.
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The Iris C1 system combines a proprietary spectroscopic ellipsometry solution from the Atlas® family with Onto Innovation’s industry leading Ai Diffract™ OCD analysis software, enabling high precision control of every critical semiconductor process step. The system incorporates a dual-arm robot, high-precision stage and high-speed focus system. The system also features advanced pattern recognition, improved thickness reproducibility and throughput. The software interface and advanced automation are compliant with standards adopted by SEMI and other organizations. The Iris system and Ai Diffract solution provides insight of complex structure profiles across etch, clean, deposition, CMP and thin films.
All-surface contamination and defectivity inspection and imaging capability for both opaque, transparent and semi-transparent wafers, reticles and glass panel level substrates
– Automatic Aperture (Canon EF) , Aperture Coupling (Nikon F) The Canon version of the Laowa 100mm Macro lens is equipped with an aperture control motor and CPU chip. The aperture can be controlled via the camera body (no aperture control ring on the lens body) and the aperture will close only during shutter release. Photographers no longer need to compose their shots in a dark viewfinder. A focus assistance indicator will also be shown in the camera. EXIF data can also be saved.
As rays of light pass through the lens, there is a point at which they converge. Focal length is the distance in millimeters between this point of convergence ...
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All-surface contamination and defectivity inspection and imaging capability for both opaque, transparent and semi-transparent wafers, reticles and glass panel level substrates
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All other mounts are manual and aperture is controlled by the aperture ring on the lens. For Canon RF users, please select Canon EF mount and use it with EF-EOS R adapter should you want to have automatic aperture function.
All-surface contamination and defectivity inspection and imaging capability for both opaque, transparent and semi-transparent wafers, reticles and glass panel level substrates
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Designed for advanced integrated circuit substrates (AICS) or advanced packaging manufacturing applications, incorporating a 250mm x 250mm large field exposure area achieving 3μm L/S resolution over a large DOF and with a throughput of >110pph
– Similar size as 1:1 macro lens Despite the extended magnification range, the size of our Laowa 100mm is actually comparable to other macro lenses in the market.
The Iris T1 is a spectroscopic ellipsometer system that provides accurate, repeatable in-line thickness and optical constant measurements of single and multi-layer dielectric films for fab-wide applications. Built on the same field-proven Atlas platform, the Iris T1 system leverages the most recent advances in optics and algorithms, making it best-in-class for performance and cost-of-ownership. The SEMI/CE compliant software interface enables recipe sharing between the Iris series.
Based on the latest Windows 10 OS and a 64-bit architecture, the Ai Diffract™ software interface and advanced automation are compliant with standards adopted by SEMI and other organizations. Ai Diffract software also includes Onto’s unique model guided machine learning that enables fast, flexible and robust film and OCD recipe setup on the Iris S system.
Based on a common HBLS optical design derived from our seventh generation Atlas platform and best-in-class deep ultraviolet (DUV) optics, the Iris R1 system offers maximum sensitivity and accuracy to CMP process excursions and enables device makers to establish APC control solutions with high-accuracy feedback. With SpectraProbe™ and NanoDiffract® analysis solutions enabling direct measurements within device and active areas, users are now able to monitor minor process excursions and optimize their processes for higher yields.
The Iris S system offers a single platform solution for thin film, OCD, and wafer bow and film stress measurements on 150, 200 & 300mm wafers. It can handle a broad variety of substrates, including but not limited to SiC, GaN, glass and silicon. The system incorporates a dual-arm robot, high-precision stage, advanced pattern recognition, and a high-speed focus system for high positioning accuracy at high throughput. A state-of-the-art dual channel optical architecture offers oblique incidence Mueller Matrix spectroscopic ellipsometry (MMSE) and normal incidence spectroscopic reflectometry (SR) in a broad wavelength range from UV to IR wavelengths.
Acoustic film metrology system that provides accurate, in-line thickness measurements of semi-transparent and metal films on product wafers
– 2:1 Magnification at the same physical size Laowa 100mm f/2.8 2:1 Ultra-Macro is the second 2:1 Macro lens that we have (The first one is the 60mm f/2.8). 100mm is one of the most common focal length for macro photography usage. All of the 100mm macro lenses in the market can only reproduce 1:1 magnification (life-size) image only. The extended 2x magnification means more details can be seen through the lens. Photographers can now take advantage of the wider magnification range to capture bugs at different sizes.
Acoustic film metrology system that provides accurate, in-line thickness measurements of semi-transparent and metal films on product wafers
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Venus Optics was formed by a group of passionate industry experts and photographers who wish to create Unique, Practical & Affordable wide-angle and macro lenses.
Automated high speed sub-micron 2D inspection and combo 3D inspection/metrology for inline process control of pattern defects and next generation technologies for advanced packaging, specialty and OQA
Followed by the success of the Laowa 60mm f/2.8 2:1 Macro, the 100mm f/2.8 2:1 Macro is the 2nd member of Laowa 2:1 macro line-up. It features an apochromatic (APO) characteristic that chromatic aberration at both ‘in-focus’ & ‘out-of-focus’ is both invisible. This new 100mm lens can cover full frame sensor size and focus from 2:1 magnification to infinity. The lens has a similar physical size to other 100mm Macro lenses in the market but its wider magnification range allows macro photographers to capture subjects at any sizes. This 100mm f/2.8 lens can also focus to infinity and serve as a portrait lens with exceptional optics quality.
Only Canon EF version is equipped with a CPU chip and motor for aperture control via the camera. All other mounts are manual and aperture is controlled by the aperture ring on the lens.
Acoustic film metrology system that provides accurate, in-line thickness measurements of semi-transparent and metal films on product wafers
– Apochromat APO design (invisible CA) The Laowa 100mm f/2.8 has a Apochromat (APO) design where the chromatic aberration (CA) at BOTH in-focus & out-of-focus area (Longitudinal CA) is controlled to the minimal. CA has long been one of the most annoying aberrations for macro photography and now you can forget about this and focus more on taking a great shot.
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The Iris series of tools enable process control across a broad range of applications in high volume manufacturing with excellent performance as well as cost-of-ownership.
Aug 4, 2024 — Adaptive optics systems use wavefront sensors to measure aberrations in incoming light waves. The measured wavefront is then corrected by ...