Beam splitterworking principle

Once considered a niche technology, ARC® materials rapidly joined the mainstream of lithography processing throughout the 1980s and 1990s and are now considered an integral part of every exposure step.

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At Brewer Science, we are focused on delivering critical, real-time information to our customers to help them achieve their goals, solve their problems, and improve their current systems.

Dr. Terry Brewer’s discovery of anti-reflective coatings resulted in a revolution in the global microelectronics industry and ushered in today’s high-speed, lightweight electronic devices.

Polarizing beam splittermatrix

ARC® antireflective coatings are the industry benchmark for reflection control and light absorption during photolithography.

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Firebird Optics offers them in both plate and cube configurations for both polarizing and non-polarizing applications. Beam splitters are constructed from high quality glass, calcite and other birefringent materials with tight tolerances on both surface flatness and quality, enabling them to be used in laser applications.

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Polarizingvs nonpolarizing beam splitter

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Our line of products stretches across the whole spectrum of lithography wavelengths and is the most comprehensive product lineup in the industry.

Polarizing beam splitterprinciple

Dr. Terry Brewer's antireflective coatings revolutionized microelectronics manufacturing and ushered in today's high-speed lightweight electronic devices... Brewer Science is once again prepared to lead the industry into the next generation!

Wire GridPolarizing beam splitter

Polarizing Beam Splitters are an optical device used in various applications to divide a beam of light into two separate beams with distinct polarization states. They are an important component in many optical systems, including microscopy, interferometry, laser systems, and telecommunications.

Polarizing beam splitters are constructed using birefringent materials or thin films that exploit the polarization-dependent reflection and transmission properties. The most common type of polarizing beam splitter is made using a combination of a dichroic prism or cube and a thin film polarizer.

Polarizing beam splitters are essential tools in optical systems where the separation or manipulation of polarized light is required. They find applications in polarimetry, imaging systems, laser setups, and other fields where precise control over polarization is necessary.

Dr. Terry Brewer’s discovery of anti-reflective coatings resulted in a revolution in the global microelectronics industry and ushered in today’s high-speed, lightweight electronic devices.

As the light passes through the dichroic prism or cube, its polarization is split into two orthogonal components. One polarization component is transmitted through the prism/cube and the thin film polarizer, while the other polarization component is reflected by the thin film polarizer. The two polarized components of light exit the PBS as separate beams with distinct polarization states. One beam retains the original polarization, and the other beam has its polarization state rotated by 90 degrees.

The biggest problem facing lithographers using EUV is the RLS trade-off: simultaneous improvement of resolution, line width roughness, and photosensitivity.

Dr. Terry Brewer’s discovery of anti-reflective coatings resulted in a revolution in the global microelectronics industry and ushered in today’s high-speed, lightweight electronic devices.

At Brewer Science, we are focused on delivering critical, real-time information to our customers to help them achieve their goals, solve their problems, and improve their current systems.

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Our line of products stretches across the whole spectrum of lithography wavelengths and is the most comprehensive product lineup in the industry.

​OptiStack® multilayer systems are our flagship lithography technology, and are used for leading-edge high volume IC manufacturing.

Polarizing beam splitterCube

Dr. Terry Brewer’s discovery of anti-reflective coatings resulted in a revolution in the global microelectronics industry and ushered in today’s high-speed, lightweight electronic devices.

Polarizing beam splitterCube thorlabs

Brewer Science offers the most diverse catalog of 193-nm BARCs in the industry, with over 50 materials available commercially. Our 193-nm BARCs are designed with photoresist compatibility and process flexibility in mind, and many offer tunable optical properties allowing for further process customization.

The unpolarized or randomly polarized light enters the Polarizing Beam Splitter. The incoming light beam then encounters a dichroic plate, prism or cube, which is made of a birefringent material like calcite or other appropriate crystals. The crystal structure of these materials causes them to exhibit different refractive indices for light polarized parallel and perpendicular to a specific axis. In combination with the dichroic prism/cube, a thin film polarizer is often used to enhance the polarization separation. The thin film polarizer is designed to reflect one polarization state while transmitting the other.

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Our line of products stretches across the whole spectrum of lithography wavelengths and is the most comprehensive product lineup in the industry.

Before ARC® materials were introduced in 1981, IC manufacturers faced increasing challenges posed by reflections from the underlying substrate during the exposure step. The highly reflective substrate (typically a polished silicon wafer) would cause light from the exposure to bounce back into the photoresist, resulting in phenomena such as standing waves and reflective notching. These defects could ruin the fidelity of the pattern in the photoresist. Brewer Science introduced ARC® antireflective coatings to mitigate these reflections and allow for the continued reduction of IC feature sizes for decades to come. Without the introduction of ARC® materials, the nanoscale circuitry that drives modern electronic devices would not be possible.

Polarizing Beam splitterthorlabs

Although cutting-edge lithography has moved to shorter wavelengths, i-line (365-nm) and deep ultraviolet (DUV, or 248-nm) lithography continue to be industry workhorses for many critical steps of the IC manufacturing process. In addition, many devices that are part of the Internet of Things are created using these legacy processes. Brewer Science maintains a full catalog of DUV and i-line antireflective coatings to meet all of these needs.

As the original bottom antireflective coatings (BARCs), ARC® antireflective coatings continue to be the industry benchmark for reflection control and light absorption during photolithography. Our proven line of anti-reflective coatings spans all the way from legacy 365-nm (i-line) processes to cutting-edge 193-nm immersion processes. ARC® materials are known for their customizable process window, broad photoresist compatibility, and benchmark pattern fidelity.

Our line of products stretches across the whole spectrum of lithography wavelengths and is the most comprehensive product lineup in the industry.

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The basic function of a polarizing beam splitter is to transmit light of a certain polarization while reflecting light of orthogonal polarization. It splits an incoming unpolarized or randomly polarized light beam into two separate output beams: one that retains its original polarization and another that has its polarization perpendicular to the input polarization.