This Fein Optic M68 critical dimension semiconductor microscope system has been designed for measurement of critical dimensions of semiconductors. The microscope system includes a PAXcam X5 camera equipped with PAX-it! Basic Measurement, PAX-it! Image Analysis, and PAX-it! Critical Dimensions software modules. Providing observation in brightfield, darkfield, polarization, and DIC methods, outstanding optical performance and crisp images, which generate reliable and reproducible results. The M68 supports up to a 200mm diameter wafer and 11 inches / 279.4mm of FPD (Flat Panel Display). Please contact Microscope World for a quote or further information.

Optical surface roughness specification

Illumination: 10W LED Brightfield/Darkfield reflected illuminator, electronic variable aperture and field diaphragm, center adjustable; Brightfield/Darkfield selector; slots for filters and polarizing kit. Filters & Attachments: Polarizing kit, Interference filters, DIC prism, IF550 Yellow Interference Filter for Photoresist inspection. Stage Micrometer: NIST certified stage micrometer with 2 separate scales - 1mm divided into 100 divisions and 10mm divided into 100 divisions. Camera & Software: System includes the PAXcam X5, 5 megapixle color camera with recommended c-mount adapter and PAX-it! Basic Measurement, PAX-it! Image Analysis, and PAX-it! Critical Dimensions modules. Imaging computer with i5 processor, 32GB / 512GB and 2 hours of online training sessions. Size: 683mm (26.89") D x 519mm (20.43") H x 539mm (21.22") W