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Energetiq’s patented Electrodeless Z-Pinch™ technology continues to set the standard for EUV and soft x-ray light sources. The EQS-10 maintains the low debris, long bore lifetime, and high spatial stability that customers expect, ensuring minimal downtime and maximizing operational efficiency. Supported by Hamamatsu Photonics’ global network, the EQS-10 is a reliable solution that adapts to the needs of the industry.

The EQS-10 integrates Energetiq’s unique direct fueling system, which can reduce gas consumption by up to 60%, delivering an efficient, cost-effective solution for the semiconductor industry. This translates to a 25% reduction in cost per watt, enabling organizations to achieve greater performance at lower operating costs.

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Energetiq Technology, a subsidiary of Hamamatsu Photonics and a leader in high-performance light sources for advanced semiconductor and scientific applications, announced the launch of the EQS-10 Electrodeless Z-Pinch EUV Light Source. The EQS-10 represents a significant leap forward in extreme ultraviolet (EUV) light generation, doubling performance while drastically reducing ownership costs.

Shannon, writes, edits and produces Semiconductor Digest’s news articles, email newsletters, blogs, webcasts, and social media posts. She holds a bachelor’s degree in journalism from Huntington University in Huntington, IN. In addition to her years of freelance business reporting, Shannon has also worked in marketing and public relations in the renewable energy and healthcare industries.

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Energetiq will debut the EQS-10 at the SPIE Photomask Technology + Extreme Ultraviolet Lithography Conference, taking place from September 29 to October 3, 2024, in Monterey, California.

The EQS-10 builds on a field-proven platform and delivers up to four times the energy per pulse with an impressive operating frequency of up to 5 kHz. Designed with solid-state switching technology, the EQS-10 ensures unmatched efficiency, making it the go-to solution for demanding EUV applications, including EUV metrology, resist development and defect inspection.

EUV General Manager Don McDaniel, PhD., states: “The EQS-10 is a testament to our commitment to innovation and meeting the evolving needs of the semiconductor industry. With its unprecedented performance and cost-efficiency, we’re proud to offer a solution that not only boosts throughput but also reduces operating costs. The EQS-10 is an important advancement for EUV metrology, resist development, and defect inspection, and we’re thrilled to bring this cutting-edge technology to our customers worldwide.”