IEEE 802.15 is the working group for Wireless Specialty Networks (WSN), which are used in IoT, wearables and autonomous vehicles.

The theoretical speedup when adding processors is always limited by the part of the task that cannot benefit from the improvement.

Microelectromechanical Systems are a fusion of electrical and mechanical engineering and are typically used for sensors and for advanced microphones and even speakers.

The droplet generator is a small vessel. In operation, tin is loaded into the droplet generator and then heated. At that point, a train of tiny tin droplets flow out from the droplet generator, through a filter and into the vacuum chamber in the source. The droplets are 25 microns in diameter and are falling at a rate of 50,000 times a second.

Extreme UVmeaning

A system on chip (SoC) is the integration of functions necessary to implement an electronic system onto a single substrate and contains at least one processor

IEEE Standard for Design and Verification of Low-Power Integrated Circuits also known by its Accellera name of Unified Power Format (UPF)

Functional Design and Verification is currently associated with all design and verification functions performed before RTL synthesis.

Data storage and computing done in a data center, through a service offered by a cloud service provider, and accessed on the public Internet.

Interconnect standard which provides cache coherency for accelerators and memory expansion peripheral devices connecting to processors.

A type of processor that traditionally was a scaled-down, all-in-one embedded processor, memory and I/O for use in very specific operations.

Extreme ultraviolet (EUV) lithography is a soft X-ray technology, which has a wavelength of 13.5nm. Today’s EUV scanners enable resolutions down to 22nm half-pitch. In a system, an EUV light source makes use of a high power laser to create a plasma. This, in turn, helps emit a short wavelength light inside a vacuum chamber. In the chamber, the system uses several multilayer mirrors, which act to reflect light via interlayer interference.

A software tool used in software programming that abstracts all the programming steps into a user interface for the developer.

Hardware Verification Language, PSS is defined by Accellera and is used to model verification intent in semiconductor design.

Electronic Design Automation (EDA) is the industry that commercializes the tools, methodologies and flows associated with the fabrication of electronic systems.

At 7nm, single patterning is possible with EUV, but is a relatively slow operation with today’s resists and can cause unwanted random or stochastic defects in patterns, which affect yield.

A lab that wrks with R&D organizations and fabs involved in the early analytical work for next-generation devices, packages and materials.

Extremeultraviolet lithography machine

At newer nodes, more intelligence is required in fill because it can affect timing, signal integrity and require fill for all layers.

The basic architecture for most computing today, based on the principle that data needs to move back and forth between a processor and memory.

Design verification that helps ensure the robustness of a design and reduce susceptibility to premature or catastrophic electrical failures.

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An approach in which machines are trained to favor basic behaviors and outcomes rather than explicitly programmed to do certain tasks. That results in optimization of both hardware and software to achieve a predictable range of results.

In the scanner, the light bounces off a complex scheme of 10 surfaces or multi-layer mirrors. First, the light goes through a programmable illuminator. This forms a pupil shape to illuminate the right amount of light for the EUV mask.

The Unified Coverage Interoperability Standard (UCIS) provides an application programming interface (API) that enables the sharing of coverage data across software simulators, hardware accelerators, symbolic simulations, formal tools or custom verification tools.

The actual EUV source is situated on the fab floor. Attached to the EUV scanner, the source consists of a droplet generator, collector and a vacuum chamber. In EUV, the process takes place in a vacuum environment, because nearly everything absorbs EUV light.

A data center is a physical building or room that houses multiple servers with CPUs for remote data storage and processing.

A statistical method for determining if a test system is production ready by measuring variation during test for repeatability and reproducibility.

EUV was originally slated to be introduced at the 45/40nm process node, but problems with the power source to achieve sufficient throughput have forced multiple delays. It was considered a critical component at 16/14nm as a way of avoiding double patterning using 193nm immersion. EUV systems began shipping for 7nm processes.

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Wired communication, which passes data through wires between devices, is still considered the most stable form of communication.

"RR-TAG" is a technical advisory group supporting IEEE standards groups working on 802.11, 802.12, 802.16, 802.20, 802.21, and 802.22.

Data processing is when raw data has operands applied to it via a computer or server to process data into another useable form. This definition category includes how and where the data is processed.

Key to an EUV system is the source. Based on a laser-produced-plasma (LPP) technology, the EUV source consists of several parts, including a carbon dioxide (CO²) laser. The laser, which provides power for the source, is located under the fab floor in the sub-fab.

A transmission system that sends signals over a high-speed connection from a transceiver on one chip to a receiver on another. The transceiver converts parallel data into serial stream of data that is re-translated into parallel on the receiving end.

The use of metal fill to improve planarity and to manage electrochemical deposition (ECD), etch, lithography, stress effects, and rapid thermal annealing.

Nodes in semiconductor manufacturing indicate the features that node production line can create on an integrated circuit, such as interconnect pitch, transistor density, transistor type, and other new technology.

Separate electronic devices using Internet or other connections to communicate among the devices. Usually sensors or actuators are sending data to a computing hub.

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Then, EUV light hits the mask, which is also reflective. It bounces off six multi-layer mirrors in the projection optics. Finally, the light hits the wafer at an angle of 6%. Each multi-layer mirror reflects about 70% of the light. Based on various calculations, the EUV scanner itself has a transmission rate of only 4%.

Combines use of a public cloud service with a private cloud, such as a company's internal enterprise servers or data centers.

An eFPGA is an IP core integrated into an ASIC or SoC that offers the flexibility of programmable logic without the cost of FPGAs.

Then comes the really hard part. The pre-pulse laser hits the spherical tin droplet and turns it into a pancake-like shape. Then the laser unit fires again, representing the main pulse. The main pulse hits the pancake-like tin droplet and vaporizes it.

Extreme uv lightlithography

The goal is to hit a droplet with precision. This determines how much of the laser power gets turned into EUV light, which is referred to as conversion efficiency (CE).

Data centers and IT infrastructure for data storage and computing that a company owns or subscribes to for use only by that company.

At 5nm, double patterning will be required on the critical layers even with EUV. Even though it requires more expensive steps, double patterning means the pitches of features can be relaxed and then processed, which can reduce the number of defects.

Extremeultraviolet lithography

In the vessel, there is a camera. A droplet passes a certain position in the chamber. Then, the camera tells the seed laser in the sub-fab to fire a laser pulse into the main vacuum chamber. This is called the pre-pulse.

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A vulnerability in a product’s hardware or software discovered by researchers or attackers that the producing company does not know about and therefore does not have a fix for yet.

The laser consists of two parts—a seed laser (pre-pulse and main pulse) and a power amplifier. Today’s EUV sources use a 20-kilowatt laser.

Actions taken during the physical design stage of IC development to ensure that the design can be accurately manufactured.

Theories have been influential and are often referred to as "laws" and are discussed in trade publications, research literature, and conference presentations as "truisms" that eventually have limits.

Also known as the Internet of Everything, or IoE, the Internet of Things is a global application where devices can connect to a host of other devices, each either providing data from sensors, or containing actuators that can control some function. Data can be consolidated and processed on mass in the Cloud.

An integrated circuit that manages the power in an electronic device or module, including any device that has a battery that gets recharged.

Meanwhile, once the EUV light is generated, the photons hit a multi-layer mirror called the collector. The light bounces off the collector and travels through an intermediate focus unit into the scanner.

When channel lengths are the same order of magnitude as depletion-layer widths of the source and drain, they cause a number of issues that affect design.