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EUV lithography is considered better than conventional photolithography for certain aspects of chip manufacturing, particularly when it comes to miniaturisation and finer feature size.

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EUV is like a high-precision scalpel for creating the most delicate features, while DUV remains a versatile workhorse for general chip manufacturing. The choice often involves a trade-off between cost, performance, and feature size requirements.

Even though EUV Lithography is one of the most advanced techniques out there, it has its benefits and drawbacks to consider:

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Extreme ultraviolet (EUV) lithography is a cutting-edge technique to manufacture modern computer chips. It’s a type of photolithography, which utilises light to etch patterns onto silicon wafers, the foundation of integrated circuits (ICs).

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For high-volume chip production where cost and speed are crucial, deep ultraviolet (DUV) might still be preferred for some layers of the chip. However, for cutting-edge chips where maximising transistor density and performance is paramount, EUV becomes the necessary technology, especially for the most intricate layers of the circuit.

EUV lithography involves an interplay of light, engineering and material science. The following is a step-by-step breakdown of the process:

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